SEMATECH Unveils 2010 Knowledge Series on Tough Industry Challenges

ALBANY, N.Y. & AUSTIN, Texas — (BUSINESS WIRE) — January 28, 2010 — Semiconductor technologists from a wide range of fields can join the search for solutions to the industry’s most challenging issues at the 2010 SEMATECH Knowledge Series (SKS) of meetings, workshops and symposia.

This year’s SKS conferences, occurring throughout 2010, will focus on difficult questions in lithography, advanced technologies, manufacturing, and strategy. Included are a new set of meetings on installed-base equipment utilization, and a new interconnect workshop in stress management for 3D chips utilizing through-silicon vias (TSVs). Other SKS meetings – such as the biannual Litho Forum, the Extreme Ultraviolet Lithography (EUVL) Symposium, ISMI Manufacturing Week, and SEMATECH’s annual Symposia in Japan and Taiwan – will continue from previous years.

“Our 2010 SKS conferences and workshops offer front-row seats to the industry’s newest technology trends, productivity approaches, cost reduction opportunities and best practices,” said Dan Armbrust, SEMATECH President and CEO. “SKS participants can directly take part in shaping the industry’s approach to our biggest challenges in litho, front end, interconnect, metrology, productivity and sustainability.”

On the SKS horizon are the Surface Preparation and Cleaning Conference, March 22-24 in Austin, TX and the 2010 Litho Forum, May 10-12 in New York City. Also approaching are Installed-base Equipment Workshops on thermal equipment, March 23 in Austin, and implant equipment, April 20 in Boston, MA. Information on these and other SKS meetings can be found at

SKS meetings are highly interactive and allow attendees to:

  • Review and rank critical issues in bringing R&D concepts to high volume manufacturing
  • Focus on ways to extend the use of incumbent materials and technologies
  • Share data and methodologies for lowering costs and improving productivity in current and next-generation fabs, through advances in equipment, processes, resources, design, and manufacturing methods
  • Guide the industry in seeking effective solutions for future technology generations
  • Build on critical university, supplier and manufacturer relationships needed for accelerated innovation

All SKS meetings are open to the public, with several accepting sponsorships and exhibits. Additional meetings may be added during the year.


For 20 years, SEMATECH® (, the international consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.


Anne Englander, 512-356-7155
Email Contact
Dan McGowan, 512-356-3440
Email Contact

Review Article Be the first to review this article
Autodesk - DelCAM

Featured Video
Jeff RoweJeff's MCAD Blogging
by Jeff Rowe
Apple Adding To Computer Product Line Minus Ports
Currently No Featured Jobs
Upcoming Events
Electric&Hybrid Aerospace Technology Symposium 2016 at Conference Centre East. Koelnmesse (East Entrance) Messeplatz 1 Cologne Germany - Nov 9 - 10, 2016
Autodesk University Las Vegas at Las Vegas NV - Nov 15 - 17, 2016
Design & Manufacturing, Feb 7 - 9, 2017 Anaheim Convention Center, Anaheim, CA at Anaheim Convention Center Anaheim CA - Feb 7 - 9, 2017
SolidCAM: Program your CNCs directly inside your existing CAD system.
TurboCAD pro : Limited Time offer

Internet Business Systems © 2016 Internet Business Systems, Inc.
595 Millich Dr., Suite 216, Campbell, CA 95008
+1 (408)-337-6870 — Contact Us, or visit our other sites:
AECCafe - Architectural Design and Engineering EDACafe - Electronic Design Automation GISCafe - Geographical Information Services TechJobsCafe - Technical Jobs and Resumes ShareCG - Share Computer Graphic (CG) Animation, 3D Art and 3D Models
  Privacy Policy Advertise