SIGMA-C CEO To Participate On Panel: Technology Trends -- Design For Manufacturing

—(BUSINESS WIRE)—— SIGMA-C: *T WHO: Peter Feist, Chief Executive Officer of SIGMA-C, a leading provider of applied simulation software that models semiconductor fabrication from design to manufacture to increase accuracy and reduce costs. SIGMA-C's advanced engineering tools - optical lithography simulation software, e-beam lithography, optical proximity correction and data analysis - let users optimize processes prior to actual production to help increase yields. All leading-edge semiconductor manufacturers use SIGMA-C's tools. Founded in 1987, the company is headquartered in Munich, Germany, with subsidiaries in Santa Clara, Calif., and Tokyo, and an office in Seoul, Korea. Further information about how to significantly improve product yields, cycle times and equipment utilization rates is available at www.sigma-c.com. WHAT: Peter Feist will offer his insights as a panelist on the first panel, "DFM - Becoming A Real Market." He will define and discuss how Design-for-Manufacturing tools and technologies have progressed and how the market has evolved during the past 18 months. SIGMA-C delivers fascinating approaches in microlithography simulation that can dramatically reduce mask and engineering wafer costs, and improve chip yield and time to manufacturing at 65nm and below. SOLID+, SIGMA-C's DFM tool that uses 3D micro-lithography to simulate the aerial image to the macro level and the resist image to the cell level with highest accuracy, is part of a new breed of DFM tools that help bridge the gap between design and printed wafer results. WHEN: Conference - Thursday, June 8, 2006, 7:30 a.m. - 2 p.m. "DFM Becoming A Real Market" Panel - 8-9:15 a.m. WHERE: Hyatt Regency San Francisco Bay View Room 5 Embarcadero Center San Francisco, CA To register please contact Ellen Rodman at 617.788.1638 or ellen.rodman@canaccordadams.com. WHY: Design-for-Manufacturing, or DFM, has become a critical component for successfully producing advanced semiconductors. The DFM conference hosted by Canaccord Adams is an excellent forum for bringing together experts in this field. Attendees will have the opportunity to learn more about this market and hear how SIGMA-C's advanced DFM tools for lithography simulation at 65nm and below are helping companies meet their design-for-manufacturing challenges. *T



Contact:
ThinkBold Communications for SIGMA-C
Sarah Miller, 231-264-8636

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