July 21, 2008
Dassault Systemes Unveils ENOVIA High-Tech Accelerator
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Jeff Rowe - Managing Editor

by Jeff Rowe - Contributing Editor
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Dassault Systèmes (DS) announced the availability of a new PLM solution developed specifically for the high-tech industry. Based on Dassault Systèmes’ recently announced V6 platform, the ENOVIA High Tech Accelerator for New Part Request and Development enables key decision makers in the product development process to collaborate on the creation of, or request for, new parts regardless of geographical location without requiring any specialized software. Offered as an out-of-the-box (OOTB) solution, it allows companies to more effectively manage the approval, delivery, cataloging and utilization of new parts. This assists in the elimination of part information errors and enforces
standardization and re-use by the establishment of a single PLM platform designed for global intellectual property management vs. multiple standalone component data libraries or databases.

“With increased competition and shrinking margins, it’s important for high tech companies to build greater efficiency into every stage of the development process. As we have seen in recent years, managing the risks associated with a global business and complex part requests are key to long term success,” said Ed Miller, president, CIMdata. “By effectively managing those burdens, PLM solutions play an integral part in helping the industry focus attention on continuous innovation and enabling companies to realize the benefits of a truly collaborative environment.”

Built on the ENOVIA V6 platform, the latest ENOVIA High Tech Accelerator promotes innovation via an online environment for global collaboration. This approach reduces costly queue times by ensuring that real time, concurrent work processes occur. In addition, all deliverables are accomplished on a single PLM platform helping to manage intellectual property and eliminate translation errors. Customers can also gain immediate value by using the OOTB processes for almost any part request, which ultimately helps to drive lower total cost of ownership.

The latest in a line of industry-specific solutions produced by ENOVIA, the High Tech Accelerator for New Part Request and Development provides multiple benefits to manufacturers, including:
  • Maximized Part Reuse and Reduce Proliferation: the ability to bring innovative products to market faster and reducing costs is optimized by applying consistent part processes and optimizing part reuse.
  • Streamlined and Standardized Part Development: rapid response to market opportunities is enabled by streamlining new part development for new part design definition. By providing a method for standardizing the process for new part request, development process efficiencies are maximized and best practices are enabled.
  • Enhanced Monitoring and Improved Decision Making: the capability to monitor part development business metrics, at the company, project, or product level, is included, giving companies real-time information and facilitating decision making within the organization. In addition, this allows for supply chain optimization by supporting both internally
    developed and purchased part business models.
    “One of the critical challenges of new part development in the high tech industry is multi-faceted coordination across time, location and with regard to changing specifications and development cycles,” said Rob Shinno, global director, High Tech Strategy & Solutions, ENOVIA R&D, Dassault Systèmes. “With the Accelerator for New Part Request and Development, companies can communicate, collaborate and approve parts easily, regardless of their location or role. Everyone with a stake in the product has the ability to participate in the lifecycle of new part requests or development, from inception to finished product.”

    Commentary By Jeffrey Rowe, Editor

    ENOVIA really took off in earnest a couple of years ago when Dassault Systemes acquired MatrixOne Inc., a provider of collaborative PLM applications for the supply chain. The PLM Collaborative Environment portfolio, which took on the ENOVIA brand name, was intended to address customers' requirements across a wide spectrum of product and business processes, from small-scale teams to extended enterprises with many thousands of users. ENOVIA offered several levels of collaboration and addressed a broad range of industry needs with:
    ENOVIA VPLM - 3D Collaborative Virtual Product Lifecycle Management of complex product, resource, and manufacturing processes in medium and large organizations.

  • ENOVIA MatrixOne - Collaborative Product Development business processes for enterprises across a wide range of industries.

  • ENOVIA SmarTeam - Collaborative Product Data Management for small and mid-sized enterprises, engineering departments of larger organizations, and across supply chains.
    At the time the acquisition, the consolidation of the PLM industry through acquisition marched on - another case of one heavy hitter absorbing another - MatrixOne becoming ENOVIA MatrixOne. MatrixOne is a complex and comprehensive platform or environment for collaborative PLM that became part and parcel of another complex and comprehensive entity, Dassault's ENOVIA. To me, there seemed to be a bit of duplication involved with the acquisition, but there also seems to have been enough distinction that it made sense, at least at the time of the acquisition. It also seemed as though the acquisition was made more for purposes of market segment expansion than pure technology.

    Since its inception, Dassault's ENOVIA has attempted to integrate virtual product modeling, lifecycle management, and decision support for companies that manufacture complex products. The ENOVIA products are intended to help companies developing large engineering-intensive products to manage the product lifecycle in a unified environment. In theory, all parties involved with a product's lifecycle can access, share, and manage product information.

    One of the side results of the acquisition was the evolution and redefinition of what PLM actually is. Has it caused competitors to take stock and reevaluate their PLM offerings and strategies? Possibly. Has it benefited ENOVIA and/or MatrixOne customers? Probably. Has it proven to be a wise move for Dassault and the PLM industry as a whole? That still remains to be seen. From the beginning, the biggest challenge for Dassault surrounding the acquisition was how to convey what its positive impact, implications, the direction it's heading, and why it's compelling.

    ENOVIA is interesting because its platform is delivered via a flexible Service-Oriented Architecture (SOA). This gives high-tech companies that grow over time the ability to scale up and add additional capabilities without re-implementation or obsolescence issues.

    ENOVIA provides high-tech and electronics companies with collaborative PLM tools to:
    • Manage the design and development of complex products (electronics, mechanical, software, IC design) to ensure products meet or exceed requirements

  • Address the issue and complexity of globalization and out-sourcing through-out the entire product lifecycle

  • Address IP and design re-use to optimize time-to-market, cost, and quality

  • Enable end-to-end traceability from concepts and requirements to service and retirement to manage changes and impact analysis

  • Ensure the ability to meet regulatory compliance and quality standards goals

  • Optimize design for the supply-chain to meet cost, quality, and delivery expectations

  • Manage the matrix of needs, design for cost, compliance, quality, manufacturing, test and assembly to optimize products earlier in the product lifecycle.
  • Because it's based on SOA, the new version of ENOVIA, V6, and ENOVIA MatrixOne 10.8 can be integrated with existing PLM systems and with other enterprise systems. The SOA helps it open files from most CAD systems, letting users edit those files natively. V6 has become Dassault's single source of intellectual property (IP)-about product development and manufacturing. It merges what were formerly separate data models in Enovia, MatrixOne, and SmartTeam that is now provided as a single data repository.

    The ENOVIA collaborative PLM environment is popular in three primary industries – automotive, aerospace, and high-tech/electronics, because it integrates with MCAD, EDA, and ERP applications. With the current state of manufacturing and the economy, the latter industry is probably the best place to be and is likely the impetus behind the high-tech accelerator.

    The challenges of high-tech add a layer of complexity onto almost every decision these companies make in the drive to profitability, growth, and bottom-line results, and the accelerator aims to aid in these endeavors.

    The Week’s Top Stories

    At MCADCafé we track many things, including the stories that have attracted the most interest from our subscribers. Below are the news items that were the most viewed during last week.

    Bunkspeed announced HyperShot V 1.5, an upgrade to the groundbreaking HyperShot product released a year ago. The new version delivers key performance enhancements that make for solid interaction between HyperShot and all major 3D solid and surface modeling products, as well as brighter, more realistic photographs rendered yet faster from 3D models. Major improvements include:
    • Faster Performance through improved real-time raytracing by providing faster calculation of self shadows, better real-time handling of materials on objects without texture coordinates, and cached material library, which will display all materials instantly.

  • Improved Rendering through sharper shadows in the final rendering, sharper texture maps, and better turntable animation in HyperShot Pro.

  • Improved Translators including support for Rhinoceros on the Mac, plug-in available for Rhino on Windows, improved support for Pro/ENGINEER Wildfire 4, and improved SolidWorks file and IGES support.

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    You can find the full MCADCafe event calendar here.

    To read more news, click here.

    -- Jeff Rowe, MCADCafe.com Contributing Editor.


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